Features . Outline

High-Temperature Clean Oven CLH Series

A heat-resistant, high-performance filter and our unique
cooling unit enable high-temperature baking in a clean
environment (max. 530°C (max. 500°C for the V model)).
The hot-air circulation system allows excellent temperature
uniformity and class 100 air cleanliness (when the
temperature is stable).
Heat treatments at 20 ppm or lower residual O₂
concentrations is available by introducing nitrogen (N₂)
gas into the chamber.

• • High-temperature baking (max. 530°C (max. 500°C for the V model))
  • Class 100 cleanliness (when the temperature is stable)
  • Optimal for semiconductor wafer and glass substrate baking, aging and other
    　 heat treatments that require high accuracy.
  • Inert gases can be introduced to use the ovens as inert gas ovens.