Our flagship product. A broad lineup that ranges from experimental applications up to mass production with excellent temperature distribution and atmosphere control.

Features . Outline

VF-5900 Vertical Furnace for 300mm Wafers

This furnace is a heat treatment system for silicon wafer, IGBT,
polyimide and thin wafer oxidation, diffusion and CVD.
As our flagship model, this furnace is equipped with
a large-capacity stocker and features a short cycle time.

　

• • Large batch, Max 100 wafers batch processing
  • Max 16 FOUP stocks
  • Excellent temperature control from low to medium high temperature range by
    　 use of our original LGO heater
  • High-speed wafer transfer by use of single/five wafers handling robot
  • Equipped with operator friendly high performance control system

　

VF-5700 Vertical Furnace for 300mm Wafers

This heat treatment system performs silicon wafer, IGBT, polyimide
and thin wafer oxidation, diffusion and CVD. Since its height is less
than 3000 mm, this model can be easily introduced. It features
a short cycle time and high throughput.

　

• • Mini batch, flexible 25 to 50 wafers batch processing
  • High throughput using a high-power heater with fast heat-up time
  • Equipped with an operator-friendly high performance control system
  • Compact size without stocker

　

VF-5300 Stocker Type Vertical Furnace for Mass Production

This vertical furnace with a built-in stocker processes 8-inch wafers
at ultra-high temperatures in large batches.
This furnace is a semiconductor heat treatment system that can
perform oxidation, diffusion, LPCVD, activation annealing and
various other heat treatments.

　

• • Large batch, max 150 wafers batch processing
  • Max 20 cassette stocks
  • Excellent temperature control from low to medium high temperature range using
    　 our original LGO heater
  • High-speed wafer transfer by use of single/five wafers handling robot
  • Equipped with an operator-friendly high performance control system

　

VF-5100 Turn Table Type Vertical Furnace for Mass Production

This large-batch, diffusion, LPCVD, vertical furnace performs 4- to
8-inch wafer ultra-high-temperature treatment.
The system can be flexibly configured to enable your production
line to process a variety of products. This furnace excels at power
device manufacturing.

　

• • Flexible equipment configuration is available for various production lines
  • 50 to 150 wafers batch size can be selected
  • 4- to 8-inch wafer size is available
  • 4 to 8 cassette stocks
  • Excellent temperature control from low to medium high temperature range
    　 using our original LGO heater
  • High-speed wafer transfer using a single/five wafers handling robot
  • Equipped with an operator-friendly high performance control system

　

VF-3000 Low-Cost Mini Batch Vertical Furnace

This low-priced vertical furnace equipped with an auto conveyor
can be used for a range of functions from R&D to mass production
of 4- to 8-inch wafers.
We have achieved such a low price that back end users can
introduce this furnace.
Ultra-high-temperature treatment is available and best suited for
power device manufacturing.

　

• • Low-cost equipment for back end users
  • Mini batch, 50 to 75 wafers processing is available for R&D to mass-production line
  • 4- to 8-inch wafer size is available
  • Max 4 cassette stocks
  • Excellent temperature control from low to medium high temperature range using
    　 our original LGO heater
  • High-speed wafer transfer using a single wafer handling robot
  • Equipped with limited-function simple control system

　

VF-1000 Vertical Furnace for Small Production and R&D

This small production type vertical furnace for experiments and
research (R&D) achieves high-quality processing.
This furnace is compact and requires only a small installation area
but is usable for a wide range of wafer diameters and exhibits the
same temperature characteristics as those of mass-production
furnaces.

　

• • High performance processing for R&D
  • Mini batch, max 25 wafers batch processing
  • 2- to 8-inch and 300-mm wafer size are available
  • Equipped with an LGO heater to realize the same high temperature performance
    　 as mass-production equipment
  • Equipped with limited-function simple control system

　

VFS-4000 Large Bore Vertical Furnace

This large-bore vertical furnace for 4.5G/5.5G was
developed by making use of semiconductor
manufacturing equipment technologies for glass
substrate manufacturing.
This furnace is suitable for low-compaction organic EL
(OLED/AMOLED) frit sealing processes and dewatering.

　

• • The semiconductor diffusion furnace has been modified to a larger scale for the
    　 flat panel display
  • Normal pressure processing and decompression processing are possible
  • Various kinds of gas atmospheres (oxidization, reduction, neutral, corrosion, etc.)
  • Max substrate size:1300 × 1500 mm
  • Large-scale LGO heater has excellent temperature characteristics