No.1016E 2019Special Edition on Industry Modeling & Simulations of The Lamp Heating-type Rapid Thermal Processor |
| Category | TECHNICAL REPORT |
|---|---|
| Author | M. HATTORI Product Development Dept., Koyo Thermo Systems Co., Ltd. |
| Abstract | The RTP (Rapid Thermal Processor) is a single-wafer thermal processing apparatus used in the semiconductor fi eld featuring high temperature ramp rates and fast processing. In recent years, the use of materials and processes in research and development applications under processing conditions not originally anticipated is expanding. To meet these needs, we worked on modeling, simulation and experimental analysis of heating phenomena by halogen lamps, optical properties of materials and thermal balance inside the furnace. Through these efforts, we clarifi ed the points for carrying out highly accurate thermal processing performance under a broader range of conditions. In this paper, we describe the modeling and simulation of RTP, and the verifi cation of the actual device. |
| Keyword | RTP, lamp annealing, silicon wafer, heat treatment |
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